琉球大学 · 工学部 · 助教

研究关键词急速熱処理・Thin Film Semiconductor・Rapid Thermal Annealing・薄膜半導体・Annealing・(glass)・Crystallinity・Sputtering

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• Annealing Manufacturing Method Using Continuous Blue WBC (Wavelength Beam Combining) Technique2024 · M. Hishida, N. Kobata, K. Miyano, M. Nobuaki, T. Okada, and T. Noguchi
• Crystallization of a-Si films deposited by RF sputtering using blue direct diode laser2023 · M. Hishida, N. Kobata, K. Miyano, M. Nobuoka, T. Okada, and T. Noguchi
• High mobility of (111)-oriented large-domain (>100 μm) poly-InSb on glass by rapid-thermal crystallization of sputter-deposited films2022 · T. Kajiwara, O. Shimoda, T. Okada, C. J. Koswaththage, T. Noguchi, and T. Sadoh
• Formation of High-Mobility InSb Films on Glass by Sputtering and Rapid-Thermal Annealing2022 · T. Kajiwara, O. Shimoda, T. Okada, C. J. Koswaththage, T. Noguchi, and T. Sadoh

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