Nagoya University · Research Center for Low-Temperature Plasma Science

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• Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process2005 · Jpn J Appl Phys 44 巻 ( 8 ) 頁： 6241 - 6244 2005年8月
• Positive Ions in RF Discharge Plasmas of C4F8/Ar and C4F8/O2 Mixtures1998 · Jpn J Appl Phys. Pt. 1, Regular papers & short notes 37 巻 ( 10 ) 頁： 5730 - 5734 1998年10月
• Characteristics of Parallel-Plate RF Discharges in C 4F 8 Gas and C 4F 8/O 2 Mixtures1997 · Jpn J Appl Phys. Pt. 1, Regular papers & short notes 36 巻 ( 8 ) 頁： 5286 - 5289 1997年8月
• Positive Ions in C 4F 8 RF Discharge in a Planar Diode1997 · Jpn J Appl Phys. Pt. 1, Regular papers & short notes 36 巻 ( 8 ) 頁： 5296 - 5299 1997年8月

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