Nagoya University · Research Center for Low-Temperature Plasma Science

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• Thermal-cyclic etching of SiGe with selective removal over Ge using fluorocarbon-based plasma and infrared heating2026 · Journal of Vacuum Science & Technology A A 44 巻 ( 022603 ) 2026年1月
• Low-temperature atomic layer etching of platinum via sequential wet-like reactions of plasma oxidation and complexation2025 · Applied Surface Science 687 巻 ( 162325 ) 2025年4月
• Selective dry etching of TiAlC over TiN using nonhalogen N2/H2 plasma2025 · Applied Surface Science 691 巻 ( 162665 ) 2025年5月
• Controlling etch selectivity of TiAlC and TiN films in nonhalogen N-H-O plasmas: Implications for DRAM peripheral transistor fabrication2025 · Surfaces and Interfaces 74 巻 ( 107664 ) 2025年10月

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