Osaka University · Faculty of Engineering / Graduate School of Engineering

Research keywordsplasma etching・gallium nitride・gallium oxide・catalyst-referred etching・surface planarization・SiC wafers・photoelectrochemical polishing・ultra-precision machining

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• Characteristics of Metal Etching Using Catalyst-Referred Etching Assisted by Anode Oxidation2025 · Int. J. of Automation Technology Vol. 5 No. 19 p. 900-905 2025年9月 研究論文（学術雑誌）
• Dicing Process for 4H-SiC Wafers by Plasma Etching Using High-Pressure SF6 Plasma with Metal Masks2024 · Materials Science Forum Vol. 1124 p. 51-55 2024年8月21日 研究論文（学術雑誌）
• Ultra-precision smooth surface on polymer material prepared by catalyst-referred etching2024 · International Journal of Automation Technology Vol. 18 No. 2 p. 240-247 2024年3月5日 研究論文（学術雑誌）
• High-Speed Plasma Etching of Gallium Oxide Substrates Using Atmospheric-Pressure Plasma with Hydrogen-Helium Mixed Gas2023 · Solid State Phenomena Vol. 342 p. 69-72 2023年5月25日 研究論文（学術雑誌）

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