Tohoku University · Cooperative Research Center for Future Science and Technology · 教授

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• High selectivity in dry etching of silicon nitride over Si using a novel hydrofluorocarbon etch gas in a microwave excited plasma for FinFETY. Nakao, T. Matsuo, A. Teramoto, H. Utsumi, K. Hashimoto, R. Kuroda, Y. Shirai, S. Sugawa, T. Ohmi
• Impurity measurement in specialty gases using an atmospheric pressure ionization mass spectrometer with a two-compartment ion sourceMasafumi Kitano, Yasuyuki Shirai, Atsushi Ohki, Shinichi Babasaki, Tadahiro Ohmi
• Anodic oxidization of Al-Y amorphous alloy ribbons and their capacitive propertiesMikio Fukuhara, Tomoyuki Kuroda, Fumihiko Hasegawa, Yasuyuki Shirai, Toshiyuki Hashida, Kazuya Konno
• Evaluation of thermal decomposition characteristics of active specialty gases on various metal surfaces using FT-IR methodYasuyuki Shirai, Seok kiu Lee, Shinji Miyoshi, Tadahiro Ohmi

• 超高速・超低消費電力バランスドフルCMOSシステムLSIの研究大見 忠弘, 白井 泰雪, 北野 真史, 寺本 章伸, 津守 俊郎

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