Tokyo University of Agriculture and Technology · Graduate School of Engineering / Institute of Engineering · 教授

Research keywordsgermanium oxide interfaces・plasma oxidation・gate dielectrics・HfO2 thin films・ZrO2 thin films・capacitance measurements・conductance measurements・semiconductor interfaces

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• Novel fabrication process for HfO2 thin film for gate dielectric
• 堆積金属酸化法によるHfO2/Si構造の作成とその高分解能RBS評価
• Electrical characterization of germanium oxide/germanium interface prepared by electron-cyclotron-resonance plasma irradiation
• Low-temperature fabrication of ultrathin ZrO2/Si structure using metal deposition followed by oxygen annealing

• 絶縁膜の電気的特性評価技術および評価装置の開発
• 絶縁膜の電気的特性評価技術および評価装置の開発
• 高輝度・高耐久性を有する有機発光材料作成プロセスの開発と応用
• シリコン酸化膜（SiO2膜）の膜質評価に関する共同研究

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