The University of Tokyo · Graduate School of Engineering / Faculty of Engineering · 教授

Research keywordsデバイスプロセス・プラズマプロセス・半導体レーザ・量子マイクロ構造・光集積回路

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• Fundamental kinetics determining growth rate profiles of InP and GaAs in MOCVD with horizontal reactor
• High temperature annealing-induced phase transformation characteristic of nitrogen-rich hafnium nitride films
• Shortest intersubband transition wavelength (1.68 mu m) achieved in AlN/GaN multiple quantum wells by metalorganic vapor phase epitaxy
• Nonlinear kinetics of GaAs MOVPE examined by selective area growth technique

• Development of CVD process
• 変調操作を用いた非定常状態の積極利用によるULSI積層配線作製プロセスの高度化
• CVD製膜における微小温度勾配が製膜速度と物性に及ぼす効果
• エリプソメトリー、FT-IRを利用したInGaAsP CVDプロセスの解析

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