Kumamoto University · Institute for Semiconductor and Digital Research and Education · 教授

Research keywords半導体デバイス・原子層堆積（ALD）・薄膜・超臨界流体・超臨界流体薄膜堆積法（SCFD)・化学気相堆積（CVD)・プロセス工学・反応工学・材料学

This is a public-data preview. Personalized fit, contact angles, and saved workflows require sign-in.

• Development of Time-Lag Method on Barrier Properties Evaluation of Ultrathin PVD-Co(W) Films against Cu Diffusion2025 · ECS Journal of Solid State Science and Technology
• Thermal Atomic Layer Etching of Cobalt Using Sulfuryl-chloride and Hexafluoroacetylacetone2025 · ECS Journal of Solid State Science and Technology
• Surface Reaction Kinetics of Chemical Vapor Infiltration of SiC from CH3SiCl3/H2 Revealed Using Ultradeep Microchannels2025 · ACS Applied Engineering Materials
• Kinetic analysis and steric-hindrance effects in thermal atomic layer deposition of high-purity cobalt films with dicobalt hexacarbonyl tert-butylacetylene as the precursor2025 · Journal of Vacuum Science & Technology A

• 超臨界流体堆積法による半導体デバイス製造用成膜装置の自動化の実現に向けた研究開発2025
• 社会課題解決を志向した革新的計測 ・解析システムの創出2025 · CREST

• Official profile
• ORCID